特点
- HiPSTER系列中多达八个装置的同步脉冲
- 固定频率下固定脉冲数的脉冲串
- 多个装置之间的脉冲串同步
- 以相同频率重复的同步和延迟脉冲
- 可用于同步其他设备的内部触发器
- 可以通过充当主设备的另一个设备实现外部触发
- 采用一个以上磁控管的多层沉积,其中用户沉积具有受控层厚度的重复层序列
- 多个磁控管的化合物共溅射
- 用于离子选择性加速的同步和延迟衬底偏压,其中不同的离子种类在不同的时间点出现在衬底附近
- 通过触发外部诊断设备同步HiPIMS过程诊断
能够同步HiPSTER系列中的所有HiPIMS和偏置单元,以获得良好的HiPIMS体验。
HiPSTER同步装置允许用户控制多达八个HiPSTER HiPIMS电源、兼容的HiPSTER偏置单元或兼容的诊断硬件的脉冲。这使得能够在多个装置之间进行诸如同步脉冲串或者同步和延迟脉冲等操作。为了增加灵动性,HiPSTER同步单元可以从外部触发。
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